Improved Spallation Resistance of the Oxide Scale by Hf/Y Co-doping in Ni-Based Superalloy at High Temperature

doi:10.1007/s40195-022-01407-5

Abstract

Abstract:

Ni-based superalloys added with comparably higher concentrations of single-doped Hf and co-doped Hf/Y are prepared by vacuum induction melting (VIM). The oxidation properties up to 300 h at 900 °C, 1000 °C, and 1100 °C are investigated. The undoped alloy exhibited a minimum oxidation rate at 900 °C and 1000 °C. The co-doped alloy showed a higher oxidation rate; however, it possesses better scale adhesion, and no spallation occurs. Hf-doped alloy showed a lower oxidation rate and better scale adhesion at 900 °C and 1000 °C, but exhibited a shorter lifetime at 1100 °C. The spallation of the Hf-doped alloy is attributed to the precipitation of the HfO₂ in and beneath the oxide scale. The spallation in the undoped alloy is accredited to the thermal expansion mismatch between the growing oxide scale and superalloy substrate. Incorporating two reactive elements (REs) in alloy minimized the precipitation of RE oxide in the oxide scale, diminished internal oxidation in the alloy, and decreased oxide scale spallation.

Key words: Superalloys, Reactive elements, Oxidation kinetics, Microstructure, Spallation resistance

Khalil Rehman, Naicheng Sheng, Shigang Fan, Shijie Sun, Guicheng Hou, Yizhou Zhou, Xiaofeng Sun. Improved Spallation Resistance of the Oxide Scale by Hf/Y Co-doping in Ni-Based Superalloy at High Temperature[J]. Acta Metallurgica Sinica (English Letters), 2022, 35(10): 1744-1758.

Figures/Tables 14

Table 1 Elemental composition of the base alloys (in wt%) measured with ICP technique

Alloy	Ni	Co	Cr	Al	Mo + W + Ta + Re	Hf	Y	B	C
Hf/Y-doped	Bal	7.5	7	6.1	16	0.099	0.04	0.004	0.05
Hf-doped	Bal	7.5	7	6.1	16	0.13	0	0.004	0.05
Undoped	Bal	7.5	7	6.1	16	0	0	0.004	0.05

Fig. 1 OM and SEM micrographs of as-heat-treated alloy before the oxidation experiment for a-c Hf/Y-doped, d-f Hf-doped, g-i undoped superalloys

Fig. 2 Weight gain vs oxidation time curves for Hf/Y-doped, Hf-doped, and undoped alloys at a 900 °C, b 1000 °C, c 1100 °C

Fig. 3 logΔw vs logt plots at 900, 1000, and 1100 °C of a Hf/Y-doped, b Hf-doped, and c undoped superalloys

Table 2 Oxidation rate constant k (mgn cm-2n h-1) values for the second oxidation stage at 900 °C, 1000 °C, and 1100 °C

Alloy	Temperature (°C)
Alloy	900	1000	1100
Hf/Y-doped	1.59 × 10^-5	1.16 × 10^-4	5.62 × 10^-3
Hf-doped	6.50 × 10^-6	7.81 × 10^-5	2.71 × 10^-3
Undoped	3.86 × 10^-7	1.68 × 10^-6	5.62 × 10^-3

Fig. 4 XRD analysis of Hf/Y-doped, Hf-doped, and undoped alloy after 300 h at a 900 °C, b 1000 °C, and c 1100 °C. d-f Enlarged view of Al2O3 peak with 100% intensity highlighted by the dotted lines in a, b, and c, respectively

Fig. 5 Photostimulated luminescence spectra (PSLS) spectra of the oxide scale after oxidation at 1000 °C for different times of a Hf/Y-doped, b Hf-doped, c undoped alloy

Fig. 6 Surface morphology of the oxide scale after 300 h of oxidation at 900 °C with corresponding high-magnification image of dendritic (red square) and interdendritic (yellow square) regions of (a, b, c) Hf/Y-doped, d-f Hf-doped, g-i undoped alloys

Fig. 7 SEM micrograph of the surface oxide after 300 h at 1000 °C of a Hf/Y-doped, c Hf-doped, and e undoped alloy. b, d, f Corresponding high-magnification image is marked with a yellow square in images a, c, e

Fig. 8 Surface morphology of the oxide scale of the alloy after a 10 h and b 20 h of oxidation at 1100 °C

Fig. 9 SEM micrograph of the surface oxide scale after oxidation time of 300 h at 1100 °C of a Hf/Y-doped, c Hf-doped, and f undoped alloys. e Magnified image of the spalled area in (c). b, d, g Magnified view of yellow square areas in (a, c, f), respectively

Fig. 10 Cross-sectional view of the oxidized alloys a, d, g of Hf/Y-doped alloy, b, e, h Hf-doped, and c, f, i undoped alloy after 300 h at 900, 1000, and 1100 °C, respectively

Fig. 11 EPMA analysis of the cross-sectional samples of a Hf/Y-doped, b Hf-doped

Fig. 12 a Elastic modulus and b hardness of Hf/Y-doped, Hf-doped, and undoped alloys

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