Effect of Axial Magnetic Field on the Microstructure, Hardness and Wear Resistance of TiN Films Deposited by Arc Ion Plating

doi:10.1007/s40195-015-0285-x

Abstract

Abstract:

TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from (111) to (220) and finally to the coexistence of (111) and (220) texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 mT and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the (111) planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the TiN films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 mT. Moreover, the wear resistance of the films was related to the hardness H and the H ³/E* ² ratio in the manner that a higher H ³/E* ² ratio was conducive to the enhancement of the wear resistance.

Key words: Magnetic field, Arc ion plating, TiN films, Hardness, Wear resistance

Yan-Hui Zhao, Wen-Jin Yang, Chao-Qian Guo, Yu-Qiu Chen, Bao-Hai Yu, Jin-Quan Xiao. Effect of Axial Magnetic Field on the Microstructure, Hardness and Wear Resistance of TiN Films Deposited by Arc Ion Plating[J]. Acta Metallurgica Sinica (English Letters), 2015, 28(8): 984-993.

Figures/Tables 13

Fig. 1 Schematic view of the axial magnetic field-enhanced arc ion plating system used to deposit TiN films

Fig. 2 Relationship between arc voltage a, substrate current b and magnetic field intensity

Table 1 Chemical compositions of the TiN films deposited under different magnetic field intensities

Magnetic field intensity (mT)	Ti (at.%)	N (at.%)	N/Ti atomic ratio
0	47.7 ± 0.1	52.3 ± 0.1	1.096
5	46.9 ± 0.1	53.1 ± 0.1	1.132
10	45.9 ± 0.1	54.1 ± 0.1	1.179
15	45.8 ± 0.1	54.2 ± 0.1	1.183
30	45.6 ± 0.1	54.4 ± 0.1	1.193
60	45.4 ± 0.1	54.6 ± 0.1	1.203

Fig. 3 XRD patterns of TiN films deposited under different magnetic field intensities

Fig. 4 The plan-view TEM observation of TiN film at magnetic field intensity of 5 mT: a bright-field micrograph, b dark-field TEM micrograph, c selected area diffraction pattern

Fig. 5 SEM images of the TiN films deposited under different magnetic field intensities a 0 mT, b 5 mT, c 30 mT, d 60 mT

Fig. 6 Surface roughness of TiN films as a function of magnetic field intensity

Fig. 7 SEM cross-sectional image of the TiN films deposited at magnetic field intensity of 15 mT

Fig. 8 Deposition rate of TiN films as a function of magnetic field intensity

Fig. 9 Hardness a, elastic modulus b, H 3/E *2 value c of TiN films as a function of the magnetic field intensity

Fig. 10 Friction coefficient curves of TiN films deposited under different magnetic field intensities

Fig. 11 Selected profiles of the worn tracks of TiN films deposited under the conditions without magnetic field application a, with 15 mT magnetic field b

Fig. 12 Wear rate of TiN films as a function of the magnetic field intensity

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