Acta Metallurgica Sinica (English Letters) ›› 2021, Vol. 34 ›› Issue (1): 85-97.DOI: 10.1007/s40195-020-01097-x
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Tao Liu1, Yuejiao Chen2(
), Libao Chen3(
)
Received:2020-04-09
Revised:2020-04-27
Accepted:2020-05-11
Online:2021-01-10
Published:2021-01-28
Contact:
Yuejiao Chen,Libao Chen
Tao Liu, Yuejiao Chen, Libao Chen. 3D Printing Engineered Multi-porous Cu Microelectrodes with In Situ Electro-Oxidation Growth of CuO Nanosheets for Long Cycle, High Capacity and Large Rate Supercapacitors[J]. Acta Metallurgica Sinica (English Letters), 2021, 34(1): 85-97.
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Fig. 2 Digital images to show the printing process and the rheological properties of the ink: a pristine PF127 gel, PF127/Cu ink stored in inverted vials to show the viscosity; b Cu current collector printed layer by layer; c scaffold printed with PF127/Cu ink after drying; d different layers of current collector from 3 to 12 printed layers with PF127/Cu ink; e expected and actual heights of PF127/Cu ink as a function of layer number; f apparent viscosity as a function of shear rate; g storage modulus (G′) and loss modulus (G″) as a function of shear stress for the composite ink
Fig. 3 a TGA curve of the PF127 powder; b curve of the heat treatment program; c-f SEM images of top-view of the 3DP Cu lattice after debinding process; SEM images showing the morphology of the 3DP Cu lattice after further sintering process at different views; g, h SEM images of lateral-view; i-l element mapping results of the 3DP Cu lattice after further sintering
Fig. 4 SEM images to show the morphologies of CuO nanosheets on different substrates: a-c 3DP Cu@CuO nanosheet arrays; d-f Cu foam@CuO nanosheet arrays; g-i Cu foil@CuO nanosheet arrays
Fig. 5 a XRD patterns of 3DP Cu and 3DP Cu@CuO; b XPS survey spectrum of 3DP Cu@CuO and high-resolution XPS spectra for c Cu 2p and d O 1s of 3DP Cu@CuO
Fig. 6 a CV curves of 3DP Cu@CuO electrode obtained at different CVO cycles; b GCD curves of 3DP Cu@CuO electrode with different CVO cycles; c CV curves of 3DP Cu@CuO electrode with 1500 CVO cycles at various scan rates; d voltage profiles at various current density from 2 to 30 mA cm-2; e cycling performance of 3DP Cu@CuO electrode at a current density of 30 mA cm-2, the inset showing the SEM image of 3DP Cu@CuO electrode after 10,000 cycles; f GCD curves of the first and 10,000th cycles at a current density of 30 mA cm-2; g Nyquist plots of 3DP Cu@CuO before and after cycle, the inset showing the plots in high-frequency range
| Active material | Current density (mA cm-2) | Cycle number | Capacitance retention (%) | References |
|---|---|---|---|---|
| CVO Cu@CuO | 20 | 4000 | 96.45 | [ |
| NSA-CuO/Ni-foam | 10 | 500 | 93 | [ |
| Lotus-like CuO/Cu(OH)2 | 5 | 5000 | 85 | [ |
| 3D-CuONA-Cu | 30 | s4000 | 88.6 | [ |
| Cu(OH)2/Cu/Dacron | 2 | 3000 | 90 | [ |
| Cu@CoF-LDH | 10 | 1000 | 96.2 | [ |
| 3DP Cu@CuO | 30 | 5000/10000 | 93.11/88.20 | This work |
Table 1 A comparison of cycle performance with recently reported CuO electrodes
| Active material | Current density (mA cm-2) | Cycle number | Capacitance retention (%) | References |
|---|---|---|---|---|
| CVO Cu@CuO | 20 | 4000 | 96.45 | [ |
| NSA-CuO/Ni-foam | 10 | 500 | 93 | [ |
| Lotus-like CuO/Cu(OH)2 | 5 | 5000 | 85 | [ |
| 3D-CuONA-Cu | 30 | s4000 | 88.6 | [ |
| Cu(OH)2/Cu/Dacron | 2 | 3000 | 90 | [ |
| Cu@CoF-LDH | 10 | 1000 | 96.2 | [ |
| 3DP Cu@CuO | 30 | 5000/10000 | 93.11/88.20 | This work |
Fig. 7 a TEM image and b HRTEM image of the 3DP Cu@CuO, the inset showing the SAED image; c corresponding EDS elemental mapping images; d TEM image and e HRTEM image of the 3DP Cu@CuO after 10,000 cycles, the inset showing the SAED image; f corresponding EDS mapping images for Cu and O in the CuO nanosheet after 10,000 cycles
Fig. 8 a CV curves of 3DP Cu@CuO, Cu foam@CuO and Cu foil@CuO electrodes at a scan rate of 50 mV s-1; b GCD curves of 3DP Cu@CuO, Cu foam@CuO and Cu foil@CuO electrodes at a current density of 2 mA cm-2; c capacitance retention and areal capacitance versus different current densities for 3DP Cu@CuO, Cu foam@CuO and Cu foil@CuO electrodes; d comparison of specific capacitance; e schematic illustration of the advantages of the 3DP Cu@CuO electrode
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