Acta Metallurgica Sinica (English Letters) >
Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO2 and O2 as Reactive Gas
Received date: 2013-04-27
Revised date: 2013-10-31
Online published: 2014-05-07
CO2 and O2 were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering. Microstructure, composition and optical band gap of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, and UV–visible spectrophotometer, respectively. The results showed that carbon-doped titanium monoxide films (C-TiO) with a carbon concentration of 5.8 at.% were obtained in an Ar/CO2 mixed atmosphere. However, carbon-doped rutile and anatase (C-TiO2) with a carbon concentration of about 1.4 at.% were obtained in an Ar/CO2/O2 mixed atmosphere. The optical band gaps of C-TiO and C-TiO2 were about 2.6 and 2.9 eV, respectively. Both of them were narrower than that of pure TiO2 films. Films with narrowed optical band gap energy are promising in promoting their photo-catalytic activity.
Dong Xie , Feng Wen , Wenmao Yang , Xueyuan Li , Yongxiang Leng , Guojiang Wan , Hong Sun , Nan Huang . Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO2 and O2 as Reactive Gas[J]. Acta Metallurgica Sinica (English Letters), 2014 , 27(2) : 239 -244 . DOI: 10.1007/s40195-014-0049-z
| [1] | F. Han, V. Kambala, M. Srinivasan, D. Rajarathnam, R. Naidu, Appl. Catal. A 359, 25(2009)10.1016/j.apcata.2009.02.043 |
| [2] | X. Zhao, Q. Zhao, J. Yu, B. Liu, J. Non-Cryst. Solids 354, 1424(2008)10.1016/j.jnoncrysol.2006.10.093 |
| [3] | M. Takeuchi, S. Sakai, A. Ebrahimi, M. Matsuoka, M. Anpo, Top. Catal. 52, 1651(2009)10.1007/s11244-009-9300-7 |
| [4] | X. Chen, S.S. Mao, Chem. Rev. 107, 2891(2007)10.1021/cr0500535 |
| [5] | Y. Park, W. Kim, H. Park, T. Tachikawa, T. Majima, W. Choi, Appl. Catal. B 91, 355(2009)10.1016/j.apcatb.2009.06.001 |
| [6] | R. Leary, A. Westwood, Carbon 49, 741(2011)10.1016/j.carbon.2010.10.010 |
| [7] | K. Woan, G. Pyrgiotakis, W. Sigmund, Adv. Mater. 21, 2233(2009)10.1002/adma.200802738 |
| [8] | T. Tachikawa, S. Tojo, M. Fujitsuka, K. Kawai, M. Endo, T. Ohno, K. Nishijima, Z. Miyamoto, T. Majima, J. Phys. Chem. B 108, 19299(2004)10.1021/jp0470593 |
| [9] | M. Shen, Z. Wu, H. Huang, Y. Du, Z. Zou, P. Yang, Mater. Lett. 60, 693(2006)10.1016/j.matlet.2005.09.068 |
| [10] | B.H.Q. Dang, M. Rahman, D. MacElroy, D.P. Dowling, Surf. Coat. Technol. 206, 4113(2012)10.1016/j.surfcoat.2012.04.003 |
| [11] | B.H.Q. Dang, D. MacElroy, D.P. Dowling, Appl. Surf. Sci. 275, 289(2013)10.1016/j.apsusc.2012.12.121 |
| [12] | U.G. Akpan, B.H. Hameed, Appl. Catal. A 375, 1(2010)10.1016/j.apcata.2009.12.023 |
| [13] | D. Eder, Chem. Rev. 110, 1348(2010)10.1021/cr800433k |
| [14] | H. Kamisaka, T. Adachi, K. Yamashita, J. Chem. Phys. 123, 084704(2005)10.1063/1.2007630 |
| [15] | Y. Cong, F. Chen, J. Zhang, M. Anpo, Chem. Lett. 35, 800(2006)10.1246/cl.2006.800 |
| [16] | M.S. Wong, S.W. Hsu, K.K. Rao, C.P. Kumar, J. Mol. Catal. A 279, 20(2008)10.1016/j.molcata.2007.09.024 |
| [17] | A. Indarto, D.R. Yang, J.W. Choi, H. Lee, H.K. Song, J. Hazard. Mater. 146, 309(2007)10.1016/j.jhazmat.2006.12.023 |
| [18] | R.X. Li, Q. Tang, S. Yin, Tsugio Sato Fuel Process Technol. 87, 617(2006)10.1016/j.fuproc.2006.01.007 |
| [19] | A. Indarto, J.W. Choi, H. Lee, H.K. Song, Environ. Chem. Lett. 6, 215(2008)10.1007/s10311-008-0160-3 |
| [20] | H. Irie, S. Washizuka, K. Hashimoto, Thin Solid Films 510, 21(2006)10.1016/j.tsf.2005.08.374 |
| [21] | A. Zaleska, Recent Pat. Eng. 2, 157(2008)10.2174/187221208786306289 |
| [22] | Y.X. Leng, J.Y. Chen, J. Wang, G.J. Wan, H. Sun, P. Yang, N. Huang, Surf. Coat. Technol. 201, 157(2006)10.1016/j.surfcoat.2005.11.074 |
| [23] | J. Tauc, Mater. Res. Bull. 3, 37(1968)10.1016/0025-5408(68)90023-8 |
| [24] | J.F.MoulderW.F.StickleP.E.SoolK.D.Bomben, Handbook of X-ray Photoelectron Spectroscopy(Perkin-Elmer, Norwalk, 1992) |
| [25] | L. Zhang, R.V. Koka, Mater. Chem. Phys. 57, 23(1998)10.1016/S0254-0584(98)00187-4 |
| [26] | Y.X. Leng, P. Yang, J.Y. Chen, L.X. Xu, A.S. Zhao, H. Sun, J. Wang, N. Huang, Key Eng. Mater. 311, 288(2005) |
| [27] | B. Dai, W.M. Gong, X.L. Zhang, A.M. Zhu, B.A. Zhang, China Environ. Sci. 19, 410(1999) |
| [28] | B. Eliasson, U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 1063(1991)10.1109/27.125031 |
| [29] | N. Omori, H. Matsuo, S. Watanabe, M. Puschmann, Surf. Sci. 352–354, 988(1996)10.1016/0039-6028(95)01313-X |
| [30] | R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, Y. Taga, Science 293, 269(2001)10.1126/science.1061051 |
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