Acta Metallurgica Sinica (English Letters) >
Microstructure, Mechanical, and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering
Received date: 2013-05-03
Revised date: 2013-08-23
Online published: 2014-03-11
The microstructure, mechanical, and tribological properties of the carbon nitride (CNx) thin films with different nitrogen contents deposited on high-speed steel substrates by reactive magnetron sputtering were studied. CNx films with nitrogen contents from 10.7 to 28.2 at.% had an amorphous structure composing of the carbon bonds of sp2C–C, sp2C–N, and sp3C–N. The TiN inter-layer cause the adhesion of CNx films enhancement. The more nitrogen concentration led to larger film hardness and friction coefficient against GCr15 steel balls, but the wear rates decreased.
Key words： Reactive magnetron sputtering (RMS); CNx film; Microstructure; Tribology
Xiangyang Chen , Jin Zhang , Shengli Ma , Haixia Hu , Zhebo Zhou . Microstructure, Mechanical, and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering[J]. Acta Metallurgica Sinica (English Letters), 2014 , 27(1) : 31 -36 . DOI: 10.1007/s40195-013-0004-4
| [1] | H. Ito, K. Kanda, H. Saitoh, Diam. Relat. Mater. 17, 688(2008)10.1016/j.diamond.2007.08.013 |
| [2] | J. Takadoum, J.Y. Rauch, J.M. Cattenot, N. Martin, Surf. Coat. Technol. 174–175, 427(2003)10.1016/S0257-8972(03)00542-5 |
| [3] | T. Ohana, A. Goto, K. Yamamoto, T. Nakamura, A. Tanaka, Y. Osawa, H. Yodad, M. Sahashid, Y. Koga, Diam. Relat. Mater. 10, 1093(2001)10.1016/S0925-9635(00)00586-0 |
| [4] | S. Peponas, M. Gueddab, M. Benlahsen, Solid State Commun. 146, 78(2008)10.1016/j.ssc.2008.01.015 |
| [5] | D.G. Liu, J.P. Tu, H. Zhang, R. Chen, C.D. Gu, Surf. Coat. Technol. 205, 3080(2011)10.1016/j.surfcoat.2010.11.023 |
| [6] | O. Durand-Drouhin, M. Benlahsen, Solid State Commun. 131, 425(2004)10.1016/j.ssc.2004.06.013 |
| [7] | C. Fernandez-Ramos, J.C. Sanchez-Lopez, A. Justo, T.C. Rojas, I. Papst, F. Hofer, A. Fernandez, Surf. Coat. Technol. 180–181, 526(2004)10.1016/j.surfcoat.2003.10.096 |
| [8] | A. Vyas, K.Y. Li, Y.G. Shen, Surf. Coat. Technol. 203, 967(2009)10.1016/j.surfcoat.2008.09.019 |
| [9] | D.L. Yu, Y.J. Tian, J.L. Hea, F.R. Xiao, T.S. Wang, D.C. Li, L. Li, G. Zheng, O. Yanagisawa, J. Cryst. Growth 233, 303(2001)10.1016/S0022-0248(01)01492-0 |
| [10] | C. Fernandez-Ramos, J.C. Sanchez-Lopez, M. Belin, C. Donnet, F. Pascaretti, A. Fernandez, Vacuum 67, 551(2002)10.1016/S0042-207X(02)00247-6 |
| [11] | D.G. Liu, J.P. Tu, C.F. Hong, C.D. Gu, Y.J. Mai, R. Chen, Appl. Surf. Sci. 257, 487(2010)10.1016/j.apsusc.2010.07.018 |
| [12] | V. Hajek, K. Rusnak, J. Vlcek, L. Martinu, H.M. Hawthorne, Wear 213, 80(1997)10.1016/S0043-1648(97)00176-2 |
| [13] | X.Y. Chen, Z.H. Wang, S.L. Ma, V. Ji, P.K. Chu, Diam. Relat. Mater. 19, 1225(2010)10.1016/j.diamond.2010.06.013 |
| [14] | X.Y. Chen, Z.H. Wang, S.L. Ma, V. Ji, Diam. Relat. Mater. 19, 1336(2010)10.1016/j.diamond.2010.07.002 |
| [15] | E. Broitman, N. Hellgren, O. Wanstrand, M.P. Johansson, T. Berlind, H. Sjostrom, J.E. Sundgren, M. Larsson, L. Hultman, Wear 248, 55(2001)10.1016/S0043-1648(00)00519-6 |
| [16] | Y. Kusano, Z.H. Barber, J.E. Evetts, I.M. Hutchings, Surf. Coat. Technol. 124, 104(2000)10.1016/S0257-8972(99)00645-3 |
/
| 〈 |
|
〉 |
WeChat