A Novel High-Entropy Amorphous Thin Film with High Electrical Resistivity and Outstanding Corrosion Resistance

doi:10.1007/s40195-021-01255-9

Abstract

Abstract:

This study explores a novel WNbMoTaV high-entropy thin film (HETF) in amorphous structure via pulsed laser deposition system. The formation of amorphous structure of this high-entropy alloy is ascribed to the high cooling rate during the deposition process. The HETF shows a smooth surface with a height fluctuation of less than 13 nm. This film has a high electrical resistivity of ~ 320.6 μΩ∙cm and a low corrosion current density of 0.088 μA/cm². The corrosion resistance of the HETF at ambient temperature is superior to the conventional AISI 316L stainless steel. The high electrical resistivity and excellent corrosion resistance of the HETF are mainly attributed to its chemical disorder, cocktail effect and homogeneous amorphous structure. This experimental phenomenon not only provides a basis for the preparation of amorphous alloy films with low glass forming ability by pulsed laser deposition system, also promotes the potential application of WNbMoTaV HETF in the microelectronic components as resistivity sensors.

Key words: High-entropy alloys, Thin films, Electrical resistivity, Microstructures, Corrosion behaviors

Chuang-Shi Feng, Tian-Wei Lu, Tian-Li Wang, Man-Zhen Lin, Junhua Hou, Wenjun Lu, Wei-Bing Liao. A Novel High-Entropy Amorphous Thin Film with High Electrical Resistivity and Outstanding Corrosion Resistance[J]. Acta Metallurgica Sinica (English Letters), 2021, 34(11): 1537-1545.

Figures/Tables 6

Fig. 1 a Typical top surface morphologies, the corresponding inset shows several nano-sized granules on the top surface and b cross-section view by SEM; c 2D surface nanostructure by AFM; d 3D surface topography corresponding to (c)

Table 1 Related performance parameters of the thin film

Samples	D (nm)	R_a (nm)	ρ (μΩ cm)	Structure
This study	191.88	0.426 ± 0.143	320.6	Amorphous
W	5-11	-	182-225	β-phase
NbMoTaW	350	-	168	BCC
CoCrFeNi	1982	1.91	135.1	FCC

Fig. 2 a Elemental contents of all the contained elements in the thin films, granules and the target (at.%); b XRD pattern of the thin film; c TEM image of the film at low magnification, inset showing the corresponding SAED pattern; d HRTEM image of the film, showing an amorphous structure

Fig. 3 a OCP diagrams of the thin film and 316L stainless steel; b dynamic polarization curves of the WNbMoTaV HETF and 316L stainless steel; c SEM surface morphology of the thin film after corrosion

Table 2 Experimental data of electrochemical tests for the HETF and 316L stainless steel in 3.5 wt% NaCl solution with a scanning rate of 1 mV/s

Samples	E_oc (V)	E_c (V)	I_c (μA/cm²)	E_p (V)	I_p (μA/cm²)
HETF	0.252	- 0.225	0.088	-	-
316L	- 0.076	- 0.263	0.101	0.361	1.903

Fig. 4 High resolution XPS spectra of the corrosion products of as-deposited thin film as comparison: a full scan of spectrum; b W-4f; c Nb-3d; d Mo-3d; e Ta-4f; f V-2p; g O-1 s

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