A MONTE CARLO SIMULATION OF SECONDARY ELECTRON AND BACKSCATTERED ELECTRON IMAGES IN SCANNING ELECTRON MICROSCOPY

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Acta Metallurgica Sinica (English Letters) ›› 2005, Vol. 18 ›› Issue (3): 351-355 .

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A MONTE CARLO SIMULATION OF SECONDARY ELECTRON AND BACKSCATTERED ELECTRON IMAGES IN SCANNING ELECTRON MICROSCOPY

H.M.Li, Z.J.Ding

Received:1900-01-01 Revised:1900-01-01 Online:2005-06-25 Published:2009-10-10
Contact: H.M.Li

Abstract

Abstract: A new parallel Monte Carlo simulation method of secondary electron (SE) and backscattered electron images (BSE) of scanning electron microscopy (SEM) for a complex geometric structure has been developed. This paper describes briefly the simulation method and the modification to the conventional sampling method for the step length. Example simulation results have been obtained for several artificial structures.

Key words: Monte Carlo, SEM, secondary electrons

H.M.Li, Z.J.Ding. A MONTE CARLO SIMULATION OF SECONDARY ELECTRON AND BACKSCATTERED ELECTRON IMAGES IN SCANNING ELECTRON MICROSCOPY[J]. Acta Metallurgica Sinica (English Letters), 2005, 18(3): 351-355 .

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A MONTE CARLO SIMULATION OF SECONDARY ELECTRON AND BACKSCATTERED ELECTRON IMAGES IN SCANNING ELECTRON MICROSCOPY

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